The Mask Metrology group at Intel is seeking an engineer with a strong background in science and engineering to focus on nanometer-scale computer vision and metrology applications. This role involves developing algorithms and programming for image analysis in a production environment for mask and semiconductor manufacturing. The engineer will work independently to define requirements, implement features, and ensure software reliability. A deep understanding of image-based measurement tools and the mask manufacturing process is essential for success in this position.

• PhD or equivalent experience in computer science, electrical engineering, or a related field.
• 5+ years of experience in image processing, computer vision, computational geometry, or graphics.
• 5+ years of experience as a software engineer using C++.
• 5+ years of C++ programming skills, including experience with design patterns, templates, multi-threading, and large-scale software design.

• Learn about image-based metrology tools used for mask manufacturing and lithography process development.
• Troubleshoot algorithm and software errors and performance issues.
• Maintain and refactor legacy software applications.
• Manage tests, review results with stakeholders, and deploy new software versions.
• Contribute to user and developer documentation.
• Interact with users to define new requirements and implement new analysis capabilities.

• Intel offers a comprehensive benefits package including competitive pay, stock programs, healthcare coverage, retirement plans, paid time off, parental leave, and programs supporting employee wellbeing and professional development.